Audio-Technica, exclusive UK distributor for Apart Audio, is to showcase a range of the Belgian brand’s new products at ISCEx at Coombe Abbey on 8 March. The Institute of Sound and Communications Engineers’ event – aimed at commercial audio system designers and integrators – will be the first time the company’s MA amplifiers, MASK C Series and CM Design speakers will be shown in the UK.
Created to offer simple, elegant integration into all interior environments, the CM Design models feature a thin edge grille and integrated neodymium grille fixing magnets to ensure unobtrusive, easy installation. Apart’s Quick Fix connectors are used for speaker connections – avoiding the need for junction boxes and reducing installation time and costs. Clear power tap labelling on the speakers’ transformers also aids quick and easy set-up. The two-way CM Design speakers are available in both 6.5” and 8” sizes, delivering power outputs of 60W and 100W respectively (power tappable to 20/15/5W – and down to 2.5W in 70v installations).
The new MASK C series builds on the reputation of the existing MASK range for sturdiness and high quality sound at an affordable price. Available in 4.25” and 6.5” driver options, the two-way loudspeakers feature Apart’s patented Clickmount bracket to ensure perfect alignment for every loudspeaker. With an integrated spirit level and a discreet cable management system, the bracket allows for neat, efficient cabling and quick, clickable installation of the speaker.
Excellent connectivity options and an intuitive front panel make the new MA120 and MA240 (120 and 240 watts respectively) and diminutive MA30 and MA60 (30w/60w) mixing amplifiers ideal for a wide variety of applications in fixed installations. Up to two mic/line sources, four music inputs, paging mic and emergency input can be combined by the flexible amplifier architecture. With usability a high priority, the MASK C speakers’ rear panel features a simple, logical layout of inputs, outputs and priority settings to further ease the installation process.